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Forming gas
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Forming gas is a mixture of (mole fraction varies) and . It is sometimes called a "dissociated atmosphere" due to the reaction which generates it:

2 NH3 → 3 H2 + N2

It can also be manufactured by thermal cracking of ammonia, in an ammonia cracker or forming gas generator.

Forming gas is used as an atmosphere for processes that need the properties of hydrogen gas. Typical forming gas formulations (5% H2 in N2) are not explosive. It is used in chambers for gas hypersensitization, a process in which photographic film is heated in forming gas to drive out moisture and and to increase the base fog of the film. Hypersensitization is used particularly in deep-sky , which deals with low-intensity incoming light, requires long , and is thus particularly sensitive to contaminants in the film.

Forming gas is also used to regenerate in and as an atmosphere for annealing processes. It can be purchased at supply stores. It is sometimes used as a for high-temperature and , to remove of the joint without the use of flux. It also finds application in microchip production, where a high-temperature anneal in forming gas assists in silicon-silicon dioxide interface passivation.

Quite often forming gas is used in furnaces during annealing or for the thermal treatment of metals, because it reduces oxides on the metal surface.


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